Please use this identifier to cite or link to this item: http://dspace.univ-tiaret.dz:80/handle/123456789/13601
Title: Efficiency of adjusting deposition parameters on growth of thin film materials by the application of electrical discharge
Authors: BOUDALI, HALIMA FARAH
BOUMAZA, AMINA
Keywords: thin films
Sputtering process
Issue Date: Jun-2023
Publisher: Ibn Khaldoun University
Abstract: Thin films have revolutionized the field of electronics by enabling miniaturization and advanced electronic component production. Sputtering is a widely employed technique for fabricating these films. Enhancing sputtering and deposition processes necessitates understanding atomic energy and angular distribution. In our study, we aimed to investigate the impact of high pressure and high temperature, key factors influencing thin film formation. Additionally, we examined two gases and three materials to determine their effectiveness. To facilitate our research, we employed simulation programs such as SRIM and SIMTRA. Through these investigations, we aimed to uncover optimal conditions for producing high- quality thin films
URI: http://dspace.univ-tiaret.dz:80/handle/123456789/13601
Appears in Collections:Master

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