Investigation using Monte-Carlo code on the influence of high pressures and temperatures on the thin-films deposition by electrical discharge

Abstract

Thin films are a qualitative leap in the development and miniaturization of the electronic domain and the production of electronic components; one method used to produce these thin films is the sputtering. Atomic energy and angular distribution are the most effective indicators for improving spraying and thus deposition. The main objective of our work is to see the effects of other factors such as high pressure and high temperature, which have an important effect in the formation of thin films, and we used three gases in our work to see which one gives us a better result, as well as three materials (copper (conductor), silicon dioxide (insulator), gallium nitride (semiconductor)), and we used simulation programs in our work SRIM and SIMTRA